Lam Research Establishes 28nm Pitch in High-Resolution Patterning Through Dry Photoresist Technology
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Lam Research Corporation has announced the qualification of its dry photoresist technology for 28nm pitch BEOL logic at 2nm and below by imec, a leading research hub.
January 14, 2025 | 2:15 pm
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Lam Research's dry photoresist technology has been qualified by imec for advanced 28nm pitch BEOL logic, marking a significant advancement in nanoelectronics.
The qualification of Lam Research's dry photoresist technology by a leading research hub like imec is a significant endorsement. This advancement could enhance Lam's market position in nanoelectronics, potentially driving up its stock price.
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